WN and TiN metal gate workfunction variability in a 10.4 nm gate length InGaAs FinFET
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Publicación: Congreso
1624015029333
18 de xuño de 2021
/research/publications/wn-and-tin-metal-gate-workfunction-variability-in-a-104-nm-gate-length-ingaas-finfet
- N. Seoane, G. Indalecio, E. Comesaña, M. Aldegunde, A. J. García-Loureiro and K. Kalna
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